| Field Emission Scanning Electron Microscope (FESEM) with EDX |
CARL ZEISS Sigma & OXFORD, 2010 |
| Bench top SEM Sputter Coater |
Scan coat Six-HHV,2017 |
| Atomic Force Microscope (AFM)/Scanning
Tunneling Microscope (STM) |
AGILENT 5550,2009 |
| Low Temperature Photoluminescence @ l=325 nm |
HORIBA 1K3302R- D &CCS-100/202,2010 |
| Raman Spectrophotometer @ 523 @ 633 nm |
RENINSHAW INVIA ,2018 |
| Dynamic Light Scattering (DLS) |
MALVERN - ZS90 Nano & HORIBA,2018 |
| Electroluminescence set-up/ I-V measurement
set-up |
USB 200 + RAD & KEITHLEY 2400,2011 |
| Portable IV Probe Station |
PE 4,2013 |
| Solar Simulator with IV- PV set-up |
LCS-100 & ORIEL NEWPORT,2015 |
| Potentiostat / Cyclic Voltammetry |
BIOLOGIC SP 150,2017 |
| Gas Chromatography |
SHIMADZU GC-2014,2017 |
| Xenon Lamp Source- 300 W |
ORIEL OPS-A500,2017 |
| Dual Source RF/ DC Magnetron Sputtering Unit
with Chiller |
HHV-12”MSPT,2008 |
| Semi-Automatic Hydraulic Pressure |
KIMAYA-30 TON,2010 |
| Thermal Evaporation with Glove Box |
VACUUM TECHNOLOGIES,2010 |
| Electron Beam Evaporation |
SMART COAT 3.0 HHV/Edwards , 2018 |
| Chemical Vapor Deposition (CVD) for Nitride activity |
"TECHNICO", 2008 |
| Two Zone Furnace for High Temperature
Annealing with Rotary Pump for Evacuation |
"TECHNICO", 2010 |
| Chemical Vapor deposition (CVD) with Pressure
Monometer and Throttle Valve - III - Nitrides |
MTI-OTF - 1200 X -III 3S,2010 |
| Chemical Vapor Deposition (CVD)- Epitaxial Graphene |
LABTHERM,2011 |
| Rapid Thermal Annealing (RTA) Furnace |
LABTHERM, 2017 |
| Planetary Ball Mill |
QM-3SP04,2010 |
| Spin Coating Unit |
APEX- SCU-2008C,2009 |
| Rotary Evaporator |
LABQUIP,2010 |
| Fume Hood |
MODERN LAB,2009 |
| 3D - Printer |
Creality Ender -3 Neo |
